- HMS3000
- HMS3300
- HMS5000
- HMS5300
- HMS5500
- HMS7000
- 자석세트
- 샘플 마운팅 보드
- 오믹 컨택 물질
- ETCP2000
- EPS300
- EPS500
- EPS1000
- RTP1300
- 초고온용 홀 효과 측정시스템
- 포토닉 홀 효과 측정시스템
- 웨이퍼 프로파일러(wafer profiler)
- 엘립소미터(Ellipsometer)
- 반사계(Reflectometer)
- HMS-3000R
작성일 : 13-12-27 17:27
[신제품] 엘립소미터(Ellipsometer)
 글쓴이 : 에코피아(…
조회 : 3,467  

Spectroscopic Ellipsometer SE200BM
Film Thickness Measurement System


• Easy to set up
• Easy to operate with Window based software
• Advanced optics design for best system performance
• High Power DUV-VIS light source for broad band applications
• Array based detector system to ensure fast measurement
• Measure film thickness and Refractive Index up to 12 layers
• Capable to be used for real time or in-line thickness, refractive index monitoring
• System comes with comprehensive optical constants database and library
• Advanced TFProbe 3.0 Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
• Three different user level control: Engineer mode, system service mode and easy user mode
• Flexible engineer mode for various recipe setup and optical model testing
• Robust one click button (Turn-key) solution for quick and routine measurement
• Configurable measurement parameters, user preference and easiness of operation
• Fully automatic calibration and initialization for system
• Precise sample alignment interface from sample signal directly, no external optics needed
• Precise height and tilting adjustment
• Apply to many different type of substrates with different thickness
• Various options, accessories available for special configurations such as mapping stage, wavelength extension, focus spot etc.
• 2D and 3D output graphics and user friendly data management interface

System Configuration:
• Model: SE200BM-M300
• Detector: Detector Array
• Light Source: High Power DUV-Vis-NIR Combined Light Source
• Incident Angle Change: Manual
• Stage: Automatic Mapping with Rho-Theta configuration
• Software: TFProbe 3.2
• Computer: Intel Duo Core 2.0 GHz
• Monitor 19" Wide Screen LCD
• Power: 110– 240 VAC /50-60Hz, 6 A
• Warranty: One year labor and parts

• Wavelength range: 250 to 1000 nm
• Wavelength resolution: 1 nm
• Spot Size: 1 to 5 mm variable
• Incident Angle Range: 0 to 90 degree
• Incident Angle Change Resolution: 5 degree interval
• Sample Size: up to 300 mm in diameter
• Substrate Size: up to 20mm thick
• Measurable thickness range*: 0 nm to 10 µm
• Measurement Time: ~ 1s/Site
• Accuracy*: better than 0.25%
• Repeatability*: < 1 Ǻ (1 sigma from 50 thickness readings for 1500 Ǻ Thermal SiO2 on Si Wafer)

• Photometry measurement for Reflection and/Or Transmission Measurement
• Micro spot for measuring small area
• Automatic Goniometer for Incident angle changes
• Mapping X-Y Stage (X-Y mode, instead of Rho-Theta mode)
• Heating /Cooling Stage
• Vertical Sample Mounting Goniometer
• Wavelength extension to further DUV or IR range
• Scanning Monochromator Setup
• Combined with MSP for patterned sample measurement with digital imaging functions

• Semiconductor fabrication (PR, Oxide, Nitride..)
• Liquid crystal display (ITO, PR, Cell gap…..)
• Forensics, Biological films and materials
• Inks, Mineralogy, Pigments, Toners
• Pharmaceuticals, Medial Devices
• Optical coatings, TiO2, SiO2, Ta2O5…..
• Semiconductor compounds
• Functional films in MEMS/MOEMS
• Amorphous, nano and crystalline Si